| 摘要 |
PURPOSE: A contrast measure mark of a photoresist is provided to be capable of easily measuring the contrast without identifying the cross section of contrast. CONSTITUTION: A contrast measure mark comprises an outer box mark(1) having a desired space and width, an inner line mark(2) formed in the inner part of the outer box mark, and a cell pattern(3) formed in the inner line mark. At this time, the size of the inner line mark(2) is 1-3 micrometer. The outer box mark(1) and the inner line mark(2) are composed of a photoresist.
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