| 摘要 |
<p>The invention pertains to a direct write lithography system comprising: A converter comprising an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each field emitter having an activation area; A plurality of individually controllable light sources, each light source arranged for activating one field emitter; Controller means for controlling each light source individually; Focussing means for focussing each electron beam from the field emitters with a diameter smaller than the diameter of a light source on an object plane.</p> |
