PHOTOMASK, ITS MANUFACTURING METHOD AND METHOD FOR FORMING MAGNETIZATION PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photomask on which a mask pattern is formed with high accuracy. SOLUTION: In exposing procedures of a manufacturing method for the photomask having a process for forming a photoresist layer 13 on a transparent substrate base 10 having an energy ray shielding material layer 12 before an etching processing, a process for forming a resist pattern 13A by developing a latent image pattern after forming it by irradiating the photoresist layer 13 with an energy ray, a process for etching the energy ray shielding material layer 12 and a process for removing the resist 13A, a latent image 13b for diffraction slit is formed in a transmission area 15 without the energy ray shielding material layer 12 in outer peripherals of a mask pattern area by photoresist. The latent image 13b for diffraction slit is irradiated with laser beam 21 from the bottom of the transparent substrate base 10, a developer is supplied as detecting zero-order, 1st-order or 2nd-order diffracted lights and development is stopped at a point of time when light quantity ratio between diffracted lights becomes prescribed one.