| 摘要 |
This invention shortens a time required to purge, with inert gas, gas in a space (optical path space) through which exposure light passes, such as a space between a projection optical system and a substrate. Shielding members (115) are so arranged as to surround the side planes of an optical path space (113). Inert gas is supplied from a gas supply port (112) to the optical path space (113) to purge gas in the optical path space (113) with the inert gas. The shielding members (115) have passages (116) at portions where the flow of inert gas delays. The passages (116) increase the flow velocity at these portions to shorten the purge time.
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