Compact RF plasma device for cleaning electron microscopes and vacuum chambers

摘要

An improved apparatus is provided for in-situ cleaning of electron microscopes and other vacuum chambers. A special RF plasma electrode is housed in a compact cylinder constructed of standard vacuum components and a electrical feedthrough. The device allows oxygen radicals to be generated from air by a low powered RF plasma. The oxygen radical flow by convection into the electron microscope or vacuum chamber to be cleaned and react with hydrocarbons to form CO and H2O vapor which is pumped away.