| 摘要 |
A method and apparatus for printing a pattern on a substrate, by applying a photoresist layer over the substrate; locating a laser direct-imagining exposure head to print the pattern on the substrate by the application of one or more laser beams to the photoresist layer on the substrate while relative movement is effected between the exposure head and the substrate; and controlling the drive and the exposure head to cause the exposure head to print a first portion of the pattern on a first portion of the substrate at a first (normal) resolution, and a second portion of the pattern on a second portion of the substrate at a second (higher) resolution.
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