发明名称 AN ISOTOPE STRUCTURE FORMED IN AN INDIRECT BAND GAP SEMICONDUCTOR MATERIAL
摘要 A semiconductor structure has a density variation in a predetermined direction, and an external stress is applied perpendicular to the predetermined direction. The structure can be a stressed isotope superlattice (10), with density variation parallel to the crystallographic direction of the dominant intervalley scattering (for example, [100] for silicon, and [111] for germanium), and with in-plane stress arising from lattice mismatch with a single crystal overlayer or substrate (11). The external stress may also be applied mechanically, and serves to suppress or enhance phonon scattering in intervalley directions perpendicular to the predetermined direction. Applications include optical devices, transistors, quantum wires and quantum dots.
申请公布号 WO0233758(A1) 申请公布日期 2002.04.25
申请号 WO2001AU01305 申请日期 2001.10.17
申请人 SILEX SYSTEMS LIMITED;ITOH, KOHEI 发明人 ITOH, KOHEI
分类号 H01L29/04;H01L29/15;H01L29/16;H01S5/34 主分类号 H01L29/04
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