发明名称 SUPPLY APPARATUS FOR PROCESSING LIQUID
摘要 PROBLEM TO BE SOLVED: To prevent occurrence of frothing by accompanying the inflow of a processing liquid and a diluting liquid and the deterioration of the processing liquid, when the processing liquid after piercing of a sealing member of a vessel is supplied to a replenishing tank and further the diluting liquid is supplied thereto. SOLUTION: The vessel, hermetically closed at its aperture by the sealing member, is held in an immobile state toward downward direction and is pierced by a piercing means. The concentrated processing liquid is supplied to the replenishing tank 80 on the lower side across tubes 7 and 83, and the diluting liquid is supplied thereto across a diluting liquid tube 85. The tubes 7 and 83 for supplying the diluted processing liquid obtained by stirring the processing liquid with stirring members limit the flow rate, open in a liquid level L and are located on a diagonal inside wall section 80a of the replenishing tank, and the aperture of the diluting liquid tube 85 is set below the liquid level L. The occurrence of the frothing is thus suppressed, and the early deterioration of the processing liquid is prevented.
申请公布号 JP2001296641(A) 申请公布日期 2001.10.26
申请号 JP20000115366 申请日期 2000.04.17
申请人 NIDEC COPAL CORP 发明人 KIKUCHI HIROSHI
分类号 G03D3/06;G03D13/02;(IPC1-7):G03D3/06 主分类号 G03D3/06
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