| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for restoring a seed layer which removes a formed oxide surface, does not require the additional use of metal, lowers or eliminates discontinuity by promoting the increase of the seed layer in its transverse direction and is suitable for a commercial metal deposition method. SOLUTION: The method for providing the metal seed layer substantially free of the discontinuity arranged on a substrate includes bringing the seed layer arranged on the substrate into contact with an acidic electrolytic bath and applying current density of a range up to about 0.1 A/cm2 to the bath. The acidic electrolytic bath includes one or more acids, one or more copper compounds, one or more suppressing materials and water and the acidic electrolytic bath does not contain promoting materials. |
