| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve the intensities of characteristic X-rays of a background and characteristic X-rays of impurity particles in an oblique emission EPMA method. SOLUTION: In the oblique emission electron beam probe micro-X-ray analyzing method, the surface of a sample to be analyzed is irradiated with electron beam by an electron beam probe so that the angle (oblique emission angle) of characteristic X-rays, which are induced and emitted from fine particles present on the surface of the sample to be analyzed by electron beam, from the surface of the sample to be analyzed becomes 2 deg. or less and a member having a slit with a width of 0.5 mm or less or aperture with a diameter of 0.5 mm or less formed in parallel to the surface of the sample to be analyzed is arranged in front of the intake port of characteristic X-rays of an X-ray detector and the characteristic X-rays passed through the slit or aperture are observed by the X-ray detector to analyze the element of the fine particles present on the surface of the sample to be analyzed.</p> |
