METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FOR ALIGNING RETICLE USING DIFFRACTED LIGHT

摘要

PURPOSE: A method of manufacturing a semiconductor device for aligning a reticle using diffracted light is provided to improve alignment accuracy between overlaid layers in a lithography process by using the second diffracted light. CONSTITUTION: An alignment mark is formed on a semiconductor wafer. A reticle is aligned on an upper portion of the semiconductor wafer. The light is irradiated on the alignment mask. The second diffracted light is sensed by the light scattered from an edge of the alignment mark. An alignment location of the reticle is handled by sensing the second diffracted light.