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发明名称
Photoresistzusammensetzung
摘要
申请公布号
DE69425786(D1)
申请公布日期
2000.10.12
申请号
DE1994625786
申请日期
1994.06.01
申请人
SUMITOMO CHEMICAL CO., LTD.
发明人
NAKANO, YUKO;TAKEYAMA, NAOKI;UEDA, YUJI;KUSUMOTO, TAKEHIRO;OKA, HIROMI
分类号
G03F7/004;(IPC1-7):G03F7/004
主分类号
G03F7/004
代理机构
代理人
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地址
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