METHOD OF OPERATING PUMPING SYSTEM OF ION IMPLANTATION EQUIPMENT

摘要

PURPOSE: A method of operating a pumping system of an ion implantation equipment is to remove powder generated in a terminal roughing pump from a noxious gas, thereby improving a stability of a pumping operation. CONSTITUTION: A method of operating a pumping system comprising a source chamber for ionizing a source gas, a beam line chamber for implanting ions supplied in the form of an ion beam, a terminal roughing pump for making the source chamber and the beam line chamber high vacuous, and a high vacuum pump for maintaining a high vacuous state between the source chamber and terminal roughing pump and between the beam line chamber and the terminal roughing pump, comprises the steps of turning off a power source of the source chamber and the beam line chamber, turning off the high vacuous pump connected to the source chamber and the beam line chamber, supplying a venting gas through a venting gas supplying line to the source chamber.