| 摘要 |
PURPOSE: A positive photoresist coating solution is provided, which is good at controlling striation, drying strain and dropping marks as well as obtains excellent resist pattern formation. CONSTITUTION: A positive photoresist coating solution comprises (i) alkali-soluble resin, (ii) quinone diazide group containing compounds, (iii) nonionic fluorine-silicon surfactant having 10-25 part by weight of fluorine and 3-10 part by weight of silicon, (iv) organic solvent to dissolve the above component. |
