发明名称 |
SEMICONDUCTOR DEVICE AND METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor device and method thereof are provided to reduce a parasitic resistance and a parasitic capacitance by including a capacitor having high withstand voltage and high capacitance. CONSTITUTION: The semiconductor device having capacitors comprises a lower electrode(7) having an alumina thin film(8a) using a portion of a first metal layer(4) for forming a first metal wire on an interlayer dielectric(2a,2b) of a semiconductor substrate(1); an electrode(13a) using a portion of a second metal layer on the alumina thin film(8a) of the lower electrode; an upper electrode(17a) using a portion of a third metal layer(16) for forming a second metal wire on the electrode(13a) used as the upper electrode; a lead electrode(17b) connected to the lower electrode(7) using a portion of the third metal layer(16) by removing a portion of the alumina thin film(8a).
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申请公布号 |
KR20000005590(A) |
申请公布日期 |
2000.01.25 |
申请号 |
KR19990004798 |
申请日期 |
1999.02.11 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TOMINAGA ASSI |
分类号 |
H01L27/04;H01L21/02;H01L21/822;H01L27/02;H01L27/08;(IPC1-7):H01L27/02 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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