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发明名称
Process and cleaning solution for cleaning wafer substrates of metal contamination while maintaining wafer smoothness
摘要
申请公布号
IL113037(A)
申请公布日期
1999.06.20
申请号
IL19950113037
申请日期
1995.03.19
申请人
MALLINCRODT BAKER, INC.
发明人
分类号
C11D1/88;C11D1/90;C11D1/92;C11D3/26;C11D3/43;C11D7/06;C11D7/32;C23G5/02;H01L21/304;H01L21/306;(IPC1-7):C23G1/14
主分类号
C11D1/88
代理机构
代理人
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地址
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