PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS
摘要
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
申请公布号
WO9914256(A1)
申请公布日期
1999.03.25
申请号
WO1998US18408
申请日期
1998.09.03
申请人
THE B.F. GOODRICH COMPANY
发明人
RHODES, LARRY, F.;BELL, ANDREW;JAYARAMAN, SAIKUMAR;LIPIAN, JOHN-HENRY;GOODALL, BRIAN, L.;SHICK, ROBERT, A.