发明名称 WAFER CARRIER MECHANISM AND WAFER TREATING APPARATUS UTILIZING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a wafer carrier mechanism capable of smoothly carrying wafers. SOLUTION: A first and a second flow rate adjusters 25, 26 are inserted in a first and a second air flow passages 21, 22 for flowing air to/from a first and a second cylinder chambers 11, 12. When a piston 4b moves to a second stopper 16, a sensor MI2 detects the piston to reach a first displace position 17 near a moving start point, and a second electromagnetic valve 26b opens to increase the moving speed of the piston 4b. When a sensor MS2 detects the piston 4b to reach a second displace position 18 near a moving end point, the valve 26b closes to slow down the piston 4b, thereby moderating the shock of the piston 4b against a second stopper 16. At the time of speed switching, air returns to a buffer tank AT2 to avoid the so-called hammering.
申请公布号 JPH10335417(A) 申请公布日期 1998.12.18
申请号 JP19970142342 申请日期 1997.05.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HASEGAWA KOJI
分类号 H01L21/677;H01L21/304;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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