| 摘要 |
It is intended to provide a gas supply facility which can cope with the manufacture of semiconductor-integrated devices having a higher degree of integration and can improve the working efficiency. According to the present invention, a gas supply facility which comprises: a gas container (7); a gas consumption unit (3) of consuming a gas stored in said gas container; a gas supply line (8) for supplying said gas from said gas container to said gas consumption unit; a purge gas supply source for supplying a purge gas to said gas supply line; and an exhaust gas treatment unit (10) connected to the upperstream portion of said gas supply line adjacent to said gas container, for treating an exhaust gas discharged from said upperstream portion of said gas supply line by the purge gas from said purge gas supply source, is characterized by further comprising: a feedback vent line (13) capable of being opened and closed, in which one end thereof is connected to the downstream portion of said gas supply line adjacent to said gas consumption unit and the other end thereof is connected to said exhaust gas treatment unit; and a valve (V1) provided on said gas supply line between said feedback vent line and said gas consumption unit. |
