Sputter target manufacturing method for surface coating installations

摘要

A sputter target (1) in a vacuum process chamber incorporates at least one target plate (2) and a base plate (16) carrying this target plate fixed by means of a connector element (14). The opposing circumferential edges of the target plate and the base plate laterally extend over the circumferential region of the connector element positioned between these two plates. As a result, this circumferential region of the connector element remains free from electrical discharges acting on the target (1). Also claimed are a method for manufacture of such a target, and an application of the target for medium-frequency and/or high-frequency PVC sputtering.