发明名称 PULLING UP OF SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To prevent breakage of a crystal and minimally suppress increase of cost in a squeezing step for obtaining dislocation-free state in pulling up a silicon single crystal having crystal axis <110> by Czochralki process. SOLUTION: In a squeezing step, a crystal diameter is squeezed to <2.0mm while applying magnetic field having >=1,500 gauss to a hot zone in a squeezing step. Vibration and change of temperature of the melt surface become small by application of magnetic field and breakage of crystal in solid-liquid interface which occurred from the past is prevented. In a shoulder-making step followed by the squeezing step, the strength of the applied magnetic field is gradually decreased and the strength of magnetic field is decreased to 0 until step is moved from the shoulder-making step to a drum-making step. Dislocation-free single crystal having crystal axis <110> is obtained by the method and increase of cost is minimally suppressed, because magnetic field is not applied in a step after the drum-making step.
申请公布号 JPH09165298(A) 申请公布日期 1997.06.24
申请号 JP19950346827 申请日期 1995.12.13
申请人 KOMATSU ELECTRON METALS CO LTD 发明人 SONODA KOJI;MIMURA TOSHIO
分类号 C30B15/36;C30B15/22;C30B15/30;C30B29/06;C30B33/04;(IPC1-7):C30B29/06 主分类号 C30B15/36
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