发明名称 |
PULLING UP OF SILICON SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To prevent breakage of a crystal and minimally suppress increase of cost in a squeezing step for obtaining dislocation-free state in pulling up a silicon single crystal having crystal axis <110> by Czochralki process. SOLUTION: In a squeezing step, a crystal diameter is squeezed to <2.0mm while applying magnetic field having >=1,500 gauss to a hot zone in a squeezing step. Vibration and change of temperature of the melt surface become small by application of magnetic field and breakage of crystal in solid-liquid interface which occurred from the past is prevented. In a shoulder-making step followed by the squeezing step, the strength of the applied magnetic field is gradually decreased and the strength of magnetic field is decreased to 0 until step is moved from the shoulder-making step to a drum-making step. Dislocation-free single crystal having crystal axis <110> is obtained by the method and increase of cost is minimally suppressed, because magnetic field is not applied in a step after the drum-making step.
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申请公布号 |
JPH09165298(A) |
申请公布日期 |
1997.06.24 |
申请号 |
JP19950346827 |
申请日期 |
1995.12.13 |
申请人 |
KOMATSU ELECTRON METALS CO LTD |
发明人 |
SONODA KOJI;MIMURA TOSHIO |
分类号 |
C30B15/36;C30B15/22;C30B15/30;C30B29/06;C30B33/04;(IPC1-7):C30B29/06 |
主分类号 |
C30B15/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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