发明名称 GAS JETTING TOOL FOR SEMICONDUCTOR ETCHING PROCESS
摘要 <p>PROBLEM TO BE SOLVED: To double a lifetime shortened by the etching of the injection surface of a gas injector by repeated usage for a prolonged term. SOLUTION: In this injector, a large number of nozzles, from which a process gas is injected, are formed at approximately a central section, a large number of boltholes for fixing onto gas injector are formed at edge sections, and a large number of bolt head grooves, into which the heads of bolts penetrated into the above-mentioned boltholes are inserted, are formed on the injection surface side. A large number of the above-mentioned bolt head grooves 10e, 10f, into which a large number of the above-mentioned bolt heads are inserted, are also formed on the reverse surface side to the turned upside down and the injection surface 10c on the reverse surface side is abutted and fixed to the above-mentioned gas feeder 11.</p>
申请公布号 JPH09115892(A) 申请公布日期 1997.05.02
申请号 JP19960026533 申请日期 1996.02.14
申请人 SAMSUNG ELECTRON CO LTD 发明人 GO ZAIEI;TEI SHIYAKUYUU;KIN KANSEI;BOKU SHINKOU
分类号 C23F4/00;H01J37/32;H01L21/302;H01L21/304;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23F4/00
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