Verfahren zum Herstellen einer dünnen Schicht auf einem Substrat

摘要

The method is for forming a thin film on a substrate having one or more recesses without void being generated in each recess. The thin film is formed on the substrate in a vacuum atmosphere and the thin film formed on the substrate is heated to cause it to be melted and to close the entrance of each recess by the melted material. - The melted material of the thin film is exposed to a pressurised gas so that the melted material is filled into each recess of the substrate, thereby removing voids in each recess.