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发明名称
METHOD OF WASHING SEMICONDUCTOR WAFER
摘要
申请公布号
JPH0689888(A)
申请公布日期
1994.03.29
申请号
JP19910142154
申请日期
1991.06.13
申请人
MITSUBISHI MATERIALS CORP;MITSUBISHI MATERIALS SHILICON CORP
发明人
YOSHIMI TOSHIHIRO;OSADA TATSUYA
分类号
H01L21/304;H01L21/306;H01L21/308;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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