发明名称 ELECTROSTATIC CHUCK AND PLASMA DEVICE PROVIDED WITH ELECTROSTATIC CHUCK
摘要 <p>PURPOSE:To provide an electrostatic chuck, which is hardly affected by plasma damage, and which can drastically lengthen the lifespan of a sheet for electrostatic attraction, and to provide a plasma device using this electrostatic chuck. CONSTITUTION:A circular electrostatic attraction sheet 40 is arranged on the surface of a chuck main body 32. A recessed part 46 is provided on the surface of the chuck main body 32, and a slit 46 is also provided, which opens to a position that is in the proximity to the recessed part 46, and which penetrates the chuck main body 32. The folded upper end part of a band-shaped feeding sheet 42 is stored in the recessed part 46, and the sheet is almost superimposed on the surface of the chuck main body 32, and the sheet 42 is electrically connected to the electrostatic attraction sheet 40 by the connection between contacts 54 and 62. The slit is inserted into the region other than the folded part, and is drawn out of the rear surface side of the chuck main body 32. The feeding sheet 42 thus will not be exposed to plasmic atmosphere.</p>
申请公布号 JPH05200640(A) 申请公布日期 1993.08.10
申请号 JP19910204801 申请日期 1991.07.19
申请人 TOKYO ELECTRON LTD;TOSHIBA CORP 发明人 NOZAWA TOSHIHISA;ARAMI JIYUNICHI;HASEGAWA ISAHIRO;OKUMURA KATSUYA
分类号 B23Q3/15;H01L21/302;H01L21/3065;H01L21/68;H01L21/683 主分类号 B23Q3/15
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