METHOD FOR ETCHING ALUMINUM-CONTAINING LAYER,申请号JP19920286768-传众专利搜索

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发明名称	METHOD FOR ETCHING ALUMINUM-CONTAINING LAYER
摘要
申请公布号	JPH05195259(A)	申请公布日期	1993.08.03
申请号	JP19920286768	申请日期	1992.09.30
申请人	SIEMENS AG	发明人	FUIRINDAA JIN GUREEWARU;JIIKUFURIITO SHIYUWARUTSURU
分类号	C23F4/00;H01L21/3213	主分类号	C23F4/00
代理机构		代理人
主权项
地址

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