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发明名称
VAPOR REACTION EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH0582451(A)
申请公布日期
1993.04.02
申请号
JP19910241388
申请日期
1991.09.20
申请人
FUJITSU LTD
发明人
OBA TAKAYUKI
分类号
H01L21/205;H01L21/285;H01L21/302;H01L21/306;H01L21/316;H01L21/318
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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