| 发明名称 |
SCHUTZSCHICHT FUER PHOTOMASKE. |
| 摘要 |
<p>A radiation-curable composition suitable for use as a protective coating for a photographic element comprises a polymerizable acrylic compound, a polymerizable epoxy-functional silane compound, a free-radical photoinitiator capable of initiating polymerization of said acrylic compound, and 0 to 2 percent of the total composition on a weight basis of a cationic photoinitiator capable of initiating polymerization of said epoxy-functional silane compound, said composition containing epoxy functionality only in a silane compound.</p> |
| 申请公布号 |
DE3672613(D1) |
申请公布日期 |
1990.08.23 |
| 申请号 |
DE19863672613 |
申请日期 |
1986.01.16 |
| 申请人 |
MINNESOTA MINING & MFG. CO., SAINT PAUL, MINN., US |
发明人 |
KISTNER, JOHN F. C/O MINNESOTA MINING, P.O. BOX 33427 ST PAUL MINNESOTA 55133, US |
| 分类号 |
G03F7/027;C08F2/46;C08F2/48;C08F2/50;C08G59/00;C08G59/18;C08G59/20;C08G59/30;C08G59/40;C08G85/00;G03F1/62;G03F7/004;G03F7/028;G03F7/038;G03F7/075;H05K3/06;(IPC1-7):G03F1/00 |
主分类号 |
G03F7/027 |
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