首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
STANDARD SAMPLE FOR IDENTIFICATION
摘要
申请公布号
JPH01235829(A)
申请公布日期
1989.09.20
申请号
JP19880060363
申请日期
1988.03.16
申请人
HITACHI LTD;HITACHI DEVICE ENG CO LTD
发明人
EZAWA MASAYOSHI;WAKANA SHIGERU;MISUMI AKIRA;KAWAMURA TAKAO;TOMITA YOSHIFUMI;SAKATA NORIKO;EGUCHI KINYA;MAKI EMIKO;SAKAI HIROKO
分类号
G01N1/00
主分类号
G01N1/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
PHASE DETECTION AUTOFOCUS TECHNIQUES
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
LTPS TFT Substrate Structure and Method of Forming the Same
TFT SUBSTRATE STRUCTURE
ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE
METHOD OF TUNING SOURCE/DRAIN PROXIMITY FOR INPUT/OUTPUT DEVICE RELIABILITY ENHANCEMENT
METAL STRAP FOR DRAM/FINFET COMBINATION
Semiconductor Device
INTEGRATED CIRCUITS AND DEVICES WITH INTERLEAVED TRANSISTOR ELEMENTS, AND METHODS OF THEIR FABRICATION
SEMICONDUCTOR PACKAGE ASSEMBLY WITH THROUGH SILICON VIA INTERCONNECT
WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
SINGLE OR MULTI CHIP MODULE PACKAGE AND RELATED METHODS
METHOD FOR ESTIMATING DEPTH OF LATENT SCRATCHES IN SiC SUBSTRATES
SYSTEMS AND METHODS FOR PRODUCING FLAT SURFACES IN INTERCONNECT STRUCTURES
METHOD FOR FORMING FIN FIELD EFFECT TRANSISTOR (FINFET) DEVICE STRUCTURE WITH INTERCONNECT STRUCTURE
NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
LEADFRAME PACKAGE WITH PRE-APPLIED FILLER MATERIAL
SYSTEMS AND METHODS FOR ULTRAHIGH SELECTIVE NITRIDE ETCH
GROUP III ARSENIDE MATERIAL SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES
METHOD OF FABRICATING SEMICONDUCTOR DEVICE