| 摘要 |
PURPOSE: To provide a conductive polymer mutually connecting material having consistent low DC resistance by removing at least one part of a main surface so that the end of this chain projects by slipping off the an etched surface. CONSTITUTION: A surface layer is removed by a plasma etching process. That is, when plasma etching is performed, a chain end place, for example, a particle 16 projects by slipping off the etched surface layers 14 and 15. Here, an average end particle is exposed by a quantity equivalent to about half the diameter of its particle. Therefore, a conductive polymer mutually connecting material having consistent low DC resistance can be obtained. |
