SCANNING ELECTRON-BEAM EXPOSURE SYSTEM

摘要

In a scanning electron-beam exposure system for exposing a desired rectangular area which is larger than a predetermined maximum rectangle, the desired rectangular area is divided into a plurality of areas. Two sets of such divided areas are shifted two-dimensionally from each other. The one set of divided areas are exposed with half of a predetermined electron-beam dose and the other set of divided areas are also exposed with half of the predetermined dose. This serves to reduce undesirable effects at boundaries between scanned areas.