| 摘要 |
A wet etching apparatus is provided to minimize air bubbles in liquid etchant and reduce time required for supplying the liquid etchant, by forming a discharge port having a guide part on lateral sides of a dip bath. A wet etching apparatus comprises a processing chamber(100), a conveyor part(130), a dip bath(110), and a shower head(170). The processing chamber provides a space for the etching process of a substrate(150). The dip bath is installed within the processing chamber, having an open upper side in a shape of containing liquid etchant(140), and a discharge port(120) on lateral sides for supplying liquid etchant, which is in connection with a guide part(125) inclined toward a lower end of the dip bath for guiding the flow of liquid etchant. The conveyor part conveys the substrate within the dip bath. The shower head sprays the liquid etchant from an upper side of the processing chamber.
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