| 摘要 |
<p>PURPOSE:To obtain a color filter pattern which does not generate overlapping of adjacent filter patterns by forming an intermediate layer consisting of an optically transparent inorg. material along or the optically transparent inorg. material and optically transparent resin material on a color filter pattern of a lower layer. Then forming the color filter patterns of the respective layers at the time of forming the color filter patterns of the 2nd and ensuing colors. CONSTITUTION:After the color filter pattern 6a of the 1st color is formed, an inorg. coating film material essentially consisting of silicon oxide is in succession spin-coated thereon and is subjected to a heat treatment, by which the intermediate layer 3 is formed. A high-polymer material such as transparent polyimide resin previously mixed with a green coloring agent is spin-coated on the intermediate layer 3 and is subjected to a heat treatment, by which the colored layer 7 of the 2nd color is formed. The photoresist pattern 22 is then formed in the same manner as in the case of the 1st color. The similar stage is thereafter repeated. The color filter pattern having good dimensional accuracy is thereby obtd. without damaging the color filter pattern of the lower layer.</p> |
