发明名称 MASK FOR MANUFACTURING SEMICONDUCTOR
摘要 PURPOSE:To suppress the thermal expansion of a mask by providing a cooling tube in a mask plate. CONSTITUTION:A mask plate 1 and a cooling tube 2a buried in the plate 1 are provided. The internal disposition of the (one or more) tube 2a may be disposed in any direction if there are an inlet and an outlet. In this case, since a refraction does not become a problem if an exposure light source is an X-ray or an alpha-ray source, the thermal expansion of the plate 1 can be suppressed by feeding cooling gas or water through the tube 2a.
申请公布号 JPS63169027(A) 申请公布日期 1988.07.13
申请号 JP19870000665 申请日期 1987.01.05
申请人 NEC CORP 发明人 TONISHI SHIGEJI
分类号 G03F1/00;G03F1/38;G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/00
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