发明名称 SURFACE ACOUSTIC WAVE DEVICE
摘要 PURPOSE:To attain miniaturization and low cost by forming a piezoelectric thin film on a pattern of a 1st surface acoustic wave provided on an insulation substrate and forming the 2nd surface acoustic wave pattern having a frequency different from that of the 1st surface acoustic wave on the piezoelectric thin film. CONSTITUTION:A pattern 2 of the 1st surface acoustic wave device is formed on the insulation substrate 1 and the piezoelectric thin film 3 is formed on the pattern 2 by the method such as sputtering. Moreover, a pattern 4 of the 2nd surface acoustic wave device having a frequency different from that of the 1st surface acoustic wave device is formed on the film 3. The film thickness of the piezoelectric thin film 3 is selected to be a proper value to obtain a sufficient coupling coefficient. Thus, the devices of two characteristics are formed in the size of one chip thereby realizing miniaturization and low cost.
申请公布号 JPS63111711(A) 申请公布日期 1988.05.17
申请号 JP19860257257 申请日期 1986.10.29
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUI ATSUSHI
分类号 H03H9/145 主分类号 H03H9/145
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