| 摘要 |
PURPOSE:To uniform the thickness of a coated film by controlling temperature of coating material so that the ambient temperature becomes equal to the temperature of coating material during the rotary coating process. CONSTITUTION:Temperature of resist liquid 5 is detected 11, an ambient temperature in a reservoir 1 is detected 12 for comparison and a controller 10 controls a temperature regulator 9 in order to keep both temperature equal to each other. When the resist liquid temperature becomes equal to the processing ambient temperature, the solvent of resist liquid 5 dropped on a wafer 13 is vaporized almost constant and viscosity of the liquid becomes almost constantly during the coating period. Thereby, the coated film extended by centrifugal force is formed uniformly over the entire part of the wafer. |
