发明名称 PHOTOPOLYMERIZATION COMPOSITION
摘要 PURPOSE:To obtain a permanent protective mask having good qualities of an alkaline and an organic solvent resistances etc. by using a polymer etc. containing at least triallylisocyanurate as a polymerization unit. CONSTITUTION:The first component (A) is a polymer contg. triallylisocyanurate as a polymerization unit and is prepared by heating the triallylisocyanurate monomer, if necessary, with other copolymerizable monomer. The second component (B) is a polymerizable monomer having >=2 terminal ethylene groups and preferably polyfunctional esters of acrylic acid or methacrylic acid. The third component (C) is a photopolymerization initiator such as benzoin etc. The compounding ratio of each component is preferable to be 50-95wt% of the component (A): 4-40wt% of the component (B) and 0.01-10wt% of the component (C) based on the total wt. of the three components.
申请公布号 JPS6156343(A) 申请公布日期 1986.03.22
申请号 JP19840179091 申请日期 1984.08.28
申请人 MITSUBISHI CHEM IND LTD 发明人 NAGASAKA HIDEKI;TAKAHASHI NORIAKI
分类号 G03F7/032;G03F7/00;G03F7/004 主分类号 G03F7/032
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