X-RAY EXPOSURE PROCESS,申请号JP19840176223-传众专利搜索

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发明名称	X-RAY EXPOSURE PROCESS
摘要
申请公布号	JPS6154625(A)	申请公布日期	1986.03.18
申请号	JP19840176223	申请日期	1984.08.24
申请人	NEC CORP	发明人	OKADA KOICHI
分类号	G03F7/20;H01L21/027;H01L21/30	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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