| 摘要 |
PURPOSE:To improve the accuracy of ruggedness and to obtain a stamper for reproduction of information recording which is suitable for high-density recording and has good reproduction S/N by providing >=1 layers of respectively different metallic films on a base body and forming groove-shaped rugged patterns thereto with respectively different etching liquids. CONSTITUTION:A Cr film 15 is first formed by sputtering, etc. onto the surface of the metallic base body 11 consisting of, for example, Ni, etc. and thereafter an Mo film 16 is sputtered thereon. A photosensitive resist 12 is then coated thereon and thereafter electron rays beams are irradiated by electron ray drawing, etc. at 10muc/cm<2> to the part 17 corresponding to a guide groove and at 20muc/cm<2> to the part 18 corresponding to an address pit and thereafter the resist 16 in the irradiated part is removed by alkali development. The Mo film 16 exposed to the part 18 is etched by Ar ions and the Cr film 16 is slightly etched as well; at the same time, the Mo film 16 beneath the part 17 is partly etched. The Cr layer 15 is etched by chlorine plasma such as CCl4 to remove the Cr layer under the part 18 and the resist film 12 is removed, by which the stamper 4 is obtd. The stamper having high accuracy and good strength is thus obtd. |
