| 摘要 |
PURPOSE:To improve the strength and durability of a mask by removing a pinhole circumferential part by laser repair together with resist and then forming a metallic film over the entire surface, and correcting the pinhole by a lift-off method by using a releasing agent and forming an SiO2 protection film thereupon. CONSTITUTION:The circumferential part of the pinhole 4 is burnt off and removed from the mask coated with the resist 5 together with the resist 5 by using laser repair, and metal is formed over the entire surface by vapor deposition or sputtering and dipped in the releasing agent to form a correcting metallic film 8 at the pinhole part by the lift-off method. Then, a protection film 9 is provided by sputtering SiO2 over the film 8. Thus, the mask pinhole 4 is corrected by said process without using a photolithographic process, so the man- hour is reduced and the adhesive strength of the film is increased by making the surface of glass 2 rugged. Further, the protection film 9 is provided by sputtering SiO2 to increase the mask strength and also improve the durability. |
