发明名称 DEVICE FOR VAPOR DEPOSITION OF THIN FILM
摘要 PURPOSE:To facilitate a long-term vapor deposition by contriving the reduction of operational electric power and the prevention of corrosion of a crucible by arranging wires made of a substance to be deposited in the crucible and vaporizing it by irradiation with a beam such as a laser beam and supplying the wires continuously. CONSTITUTION:The air in a tank 1 is exhausted to about 10<-6>Torr and an oscillator 31 irradiates the end of a wire 30 made of a substance to be deposited in a crucible with a laser beam 32 to vaporize the substance to be deposited and the wire 30 is supplied continuously from a reel 33. When a vapor pressure in the crucible 4 becomes 0.1Torr or above, vapor of the substance to be deposited jet out from a nozzle 4 and a part of clusters become cluster ions 16 and are accelerated by an electric field between electrodes 14 and thermion attracting electrodes 10. Then these ions are bombarded against a substrate 18 to be deposited. Meanwhile, neutral clusters 15 are also bombarded against the substrate 18 by the kinetic energy of blowing. Filaments 6 heat only the part of nozzle 4a and prevent clogging due to droplets. By this constitution, the high-quality vapor- deposition film can be formed for a long time with less electric power.
申请公布号 JPS60124921(A) 申请公布日期 1985.07.04
申请号 JP19830235571 申请日期 1983.12.12
申请人 MITSUBISHI DENKI KK 发明人 YAMANISHI KENICHIROU;SHIYUHARA AKIRA;MINOWA YOSHIFUMI;KOU SANJIYU;INA TERUO
分类号 H01L21/285;C23C14/22;H01L21/203 主分类号 H01L21/285
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