| 摘要 |
A thermal development type diazo copying material comprising a support material and a photosensitive layer formed on the support material, which photosensitive layer comprises a diazo compound, a coupling component and a thermo-fusible auxiliary coloring agent, and which coupling component is capsulated by a hydrophobic polymeric material with a softening point ranging from 50 DEG C. to 150 DEG C. selected from the group consisting of hydrophobic polyester resins, hydrophobic cellulose resins, hydrophobic polyamide resins and hydrophobic polyurethane resins.
|
