| 摘要 |
PURPOSE:To obtain a compsn. capable of well etching even a polyester type photosensitive resin plate by dispersing or dissolving a nonionic surfactnat and a water-soluble resin into a water-miscible solvent. CONSTITUTION:An etching compsn. to be used in a soln. diluted with an amt. of water 2-20times its amt. is obtained by dissolving or dispersing 5-70wt% nonionic surfactant, such as polyoxyethylene nonylphenol ether and 5-30wt% water- soluble resin, such as fully saponified PVA into 10-70wt% water-miscible solvent, such as isopropanol. |
