Method of preparing transparent artworks

摘要

A method of preparing transparent artworks by forming a predetermined topological relief pattern by way of local layer-by-layer removal of the material on the side of the masking layer which is translucent to actinic radiation, with concurrent measurement of the optical phase difference between actinic light rays passing through the masking layer and a substrate transparent to actinic light, until the geometrical relief of the pattern becomes deep enough to ensure the required optical phase difference which is a multiple of 2 pi .