发明名称 Uniform thermal processing by internal impedance heating of elongated substrates
摘要 An elongated substrate may be heated in a roll processing system. At least a portion of the elongated substrate is loaded into the roll processing system. A sufficient electrical current is caused to flow in the portion of the elongated substrate to heat the portion to a desired temperature. The heating may be either resistive or inductive. The roll processing system may be a roll-to-roll type where the substrate moves as a portion of it is heated. Alternatively, the substrate may be wound into a coiled substrate and the turns of the coil insulated against undesired electrical contact. The entire coiled substrate may then be heated either resistively or inductively.
申请公布号 US7262392(B1) 申请公布日期 2007.08.28
申请号 US20040943659 申请日期 2004.09.18
申请人 NANOSOLAR, INC. 发明人 MILLER GREGORY A.
分类号 H05B6/60;H05B6/10 主分类号 H05B6/60
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