发明名称 MASK FOR HIGH CONTRAST EXPOSURE
摘要 PURPOSE:To attain a high contrast clear image by a method wherein a photochromic material is placed between a non-light emitted display device forming transparent light into an image form in response to a digital image information and a photosensitive material. CONSTITUTION:Exposed light from an exposure light source is shielded or transmitted for every image so as to form an image with a liquid crystal mask 12 of transparent type having many pixels and then light passed through the liquid crystal mask 12 is projected against a photochromic material 14. The photochromic material 14 becomes transparent where light passed through the liquid crystal mask directly impinges against the photochromic material 14 and its amount of light is attenuated at another place where the liquid impinges indirectly against the photochromic material 14. The place where no light impinges is opaque or in a dark color. Accordingly, light passed through the liquid crystal mask 12 is intensified at its contrast with the photochromic material 14 and further projected onto the photosensitive material. With such an arrangement, it is possible to get a clear image of high contrast.
申请公布号 JPH04156459(A) 申请公布日期 1992.05.28
申请号 JP19900281076 申请日期 1990.10.19
申请人 FUJI PHOTO FILM CO LTD 发明人 NAYA MASAYUKI
分类号 B29C35/08;B29C67/00;B29K105/24;G03F1/00 主分类号 B29C35/08
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