| 摘要 |
PROBLEM TO BE SOLVED: To nearly uniformize the amt. of a target to be shaved by sputtering in an erosion resion by specifying the magnetic flux density of a rectangular type magnetic field forming means to the linear part in the erosion resion of the target shaved by sputtering. SOLUTION: In a rectangular type magnetic field forming means for forming the magnetron magnetic field on the surface of the substrate side of a target, a linear part magnet 1 mainly forms the magnetic field to the linear part in a trucklike erosion resion of the target to be shaved by sputtering. The absolute value Ba of the magnetic flux density of the components horizontal to the surface of the target at the position where the magnetic flux density of the components vertical to the surface of the target in the magnetic field on a bisector (A-A line) of the rectangular long sides formed by the linar magnet 1 is >=0.02 T, and the ratio (Bb/Ba) between the absolute value Bb of the magnetic flux density of the components horizontal to the target and the absolute value Ba is 0.9 to 1.1 in all points in the erosion region.
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