| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that prevents contact failure between a photoresist layer and an exposure mask in a surrounding portion of a foreign matter or the like even when a foreign matter or the like is present between a film base of a base material to be processed and a stage, and to provide a method for manufacturing an electromagnetic wave shield mesh using the device. <P>SOLUTION: The exposure device includes: a light source unit 10 for at least projecting exposure light; a mask holding frame 20 holding an exposure mask; a stage 30 temporarily holding the base material to be treated having a photoresist layer formed thereon; and a control means 40 controlling the operation and control of the exposure device, wherein an absorption layer 31 is provided on the surface of the stage 30. <P>COPYRIGHT: (C)2008,JPO&INPIT |
