| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning method capable of removing static electricity without using a special device for soft X-ray irradiation, etc., and to provide an electooptical apparatus manufacturing method. SOLUTION: The substrate cleaning method scans a nozzle 20 for supplying a cleaning liquid with respect to the substrate 10 with an element pattern formed thereon, and cleaning the substrate 10. The discharge of the cleaning liquid L is started from an area 10B other than the element pattern forming part 10A of the substrate 10, and then, the nozzle 20 for supplying the cleaning liquid is moved to the element pattern forming part 10A so as to perform cleaning. COPYRIGHT: (C)2007,JPO&INPIT
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