| 摘要 |
PROBLEM TO BE SOLVED: To obtain a mask for film formation having the groove width nallower than the thickness of the mask by aligning and matching plural mask sheets formed with the same linear pattern grooves as each other to a specific direction and laminating and joining these sheets. SOLUTION: The plural mask sheets, for example, stainless steel sheets 1 to 3, formed with the same linear pattern grooves 5 as each other are formed. The plural mask sheets 1 to 3 are aligned and matched in the direction where the respective linear pattern grooves 5 intersect orthogonally with the mask sheets. The mask sheets are joined to each other by, for example, laser welding or adhesives to form the mask for film formation. As a result, the groove width (w) of the linear pattern grooves 5 is made narrower than the thickness (3d) of the sheets of the finished mask for film formation. The finished mask for film formation is capable of sufficiently withstanding the mechanical deformation by stresses at the time of sputtering and the production is easy. |
